Y2O3 Thermal Spray Powder

Y2O3 Thermal Spray Powder

Customization Custom processing available for any material. We can produce custom thermal spray powders and spherical powders in any material, with particle size controllable within 10–150 µm as required. Introduction SASA spherical powders are manufactured using internationally...
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Customization

 

Custom processing available for any material.

We can produce custom thermal spray powders and spherical powders in any material, with particle size controllable within 10–150 µm as required.

 

Introduction

 

SASA spherical powders are manufactured using internationally advanced UV-curable droplet-based spheroidization technology, achieving a major breakthrough in particle sphericity and uniformity.

The roundness is ≥ 98%, with excellent flowability of ≤ 38 s / 50 g and particle size tolerance of ±10 µm.

The powders are fully compatible with various automated thermal spray systems, significantly improving coating deposition efficiency and uniformity.

 

 

Product Features

 

High sphericity: sphericity > 98%; smooth, mirror-like surface; no satellite particles or tadpole-shaped particles.

Excellent flowability: superior Hall flow; smoother powder feeding and higher spray efficiency.

High density: pore-free internal structure; denser coating with greatly improved wear and corrosion resistance.

High purity: produced under inert gas protection with extremely low oxygen content.

 

 

Product Parameters

 

Item

Parameter

Chemical composition

Y2O3(Yttria)

Particle size distribution

-53+15μm,D50=35μm

Particle morphology

Spherical, sphericity > 98%

Apparent density

1.5g/cm3

Y2O3 purity

99.999%

Al

7ppm

Ca

4ppm

Co

<1ppm

Cr

<1ppm

Cu

<1ppm

Fe

<10ppm

Ga

1ppm

Mg

<1ppm

Mn

<1ppm

Na

2ppm

Ni

<1ppm

Si

9ppm

Sr

<1ppm

Ti

<1ppm

Zn

<1ppm

La

1ppm

Ce

<1ppm

 

Applications

 

(1) Aero-engine combustors, turbine components, and military electronics.

(2) Semiconductor equipment:​

Electrostatic chucks (ESC), etch chamber liners, and other exposed components - a protective coating is applied to withstand the harsh chemical attack and plasma erosion during the etching process.

 

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